FK7054 Nanoscale Technology
Credits: 7.5 points (ECTS)
Time: VT2-2024/2025,
Lecture time: Regular times - Mondays and Thursdays,
13:15 (with few exceptions, see the schedule)
Course starts: 24
March 2025, Time: 13:15, place: FP22
Registration: Register (well in advance) at www.antagning.se
Only
registered students are allowed to participate in the course.
All students
(including KTH) must register at Stockholm
University. Please
contact Gorica Nikolic from Studentexpedition
(SU) on the 4th floor of AlbaNova, E-mail:
Gorica.Nikolic@fysik.su.se
Motivation
Microelectronics
has had tremendous development during last decades broadening the field of
applications in many directions. Miniaturization is a driving force for an
astounding progress of microelectronics. For the last four decades the
undergoing technical revolution in microelectronics is well described by “Moore’s law”, according to
which, every 3 years a new generation of integrated circuits appears, in which
the number of components on the chip increases 4 times (or doubles every 18
months). Such a remarkable rate of miniaturization was demanded by industry,
because the reduction of dimensions went hand-in-hand with an increase in
performance and a decrease in the cost of the device. Modern integrated
circuits may contain several milliards transistors with a minimum feature size
less than 100 nanometers (0.1 micrometers). This would not have been possible
without development of thin film technology, nanoprocessing,
and material science. A great many sophisticated instruments and techniques,
developed to process and characterize thin films and surfaces, have already
become indispensable in virtually every research area and high-tech industry.
While the major exploitation of thin films is associated with microelectronics,
there are numerous and growing novel applications in communication, optical
electronics, energetics, coating, data storage, etc. The existing
microtechnology is approaching its physical limit and major technological
breakthroughs in terms of processes and materials will be required in a near
future, as device sizes decrease below ~45 nm, ie.,
in a new-born area of nanoelectronics. Further development requires a
continuous search for new materials advanced methods of deposition, nanoprocessing and characterization of thin films. This
challenging task would require specialists with a full knowledge of a huge
experience, accumulated in microfabrication technique and in related material
and fundamental research areas.
Aim and Goal
The course
aims at giving a basic knowledge of various micro/nano
fabrication processes, thin film materials, characterization techniques and
emerging applications used in modern micro/nano-electronics,
optics and micromachining. The goal is to learn material
science aspects and physical principles of nanoscale technology, which will
help students to understand the link between Processing-Structure-Properties-Performance
of thin film devices and to be capable of choosing proper materials, deposition
and characterization techniques for a given task. The course will make an
overview over an actual research and development and most recent trends in
nanoscale technology and will provide a basis for further studies at the
undergraduate and postgraduate level, diploma work and professional
preparation.
Content
We start by
studying basic microfabrication techniques, such as optical lithography,
different types of deposition and etching of materials; and then also study
advanced nano-fabrication and nano-characterization
techniques, such as electron-beam lithography, focused ion-beam etching and
atomic force microscopy. Laboratory exercises in the NanoFab
clean room at AlbaNova
University Center
will demonstrate how the nanoscale machinery operates in reality,
and will give you an understanding of how the microelectronic devices are
fabricated. Simultaneously, the course will contain a lot of interesting
physics, such as vacuum, plasma and electron optics, etc. The course will also
make an overview over an actual research and development and most recent trends
in nanoscale technology.
In Swedish:

Organization
Lectures,
Labs and a literature project. A number of simple home assignments will be
given to deepen the knowledge obtained during the lectures.
Participation
in labs is compulsory. Home assignments and Literature Project are optional and
will provide bonus points, which will be counted at the examination.
Labs and home assignments (information provided via Athena)
Literature
Lecture notes can be downloaded from the link
above.
The course
will be based on the book: The Materials Science of Thin Films by Milton Ohring;
Publisher: Academic Press 2001; ISBN: 0125249756.
Complementary
literature:
I.Brodie and J.J.Muray: The physics
of micro/nano-fabrication
M.J. Madou: Fundamentals of Microfabrication
Examination
Written examination
Bonus points (~50% of
the total score) will be given for fulfillment of the literature project and
home assignments.
Check-list for examination
Examination results
Evaluation criteria
Total # points: 24-26 p at the exam.
Total number of bonus points correspond to the grade E.
ECTS grades: F=6p, Fx=9p, E=12p, D=15p, C=18p, B=21p, A=24p (estimated values, may be slightly changed )
Examination solutions
Teaching language: English
Contact:
Experimental Condensed Matter Physics Group
Department of Physics, Stockholm
University,
Albanova
University Center, SE-10691 Stockholm, Sweden
WWW: http://ekmf.fysik.su.se/
Last updated: 12 March 2025